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Fluoro Mechanic  


Download the Vacuum Wand Overview

Semiconductor Silicon Wafer Handling Tools

Vacuum Wand for Semiconductor Wafer Processing

Our unique valve* ensures reliable suction and release of a semiconductor wafer.
The well polished inner wall of the valve part minimizes particle generation.
The optically polished wafer tip provides excellent adhesion to a wafer.
The wand body can be easily detached from the tubing.
*US Patent 6176265, Japanese Patents 1698352 and 1885465
You can find the wand which meets your requirements on our interactive catalog.

 

C series for ESD protection

C Series Vacuum Wand 

The body covered with Conductive Nylon reduces electrostatic effects towards a wafer.
The wafer tip is made of Conductive PEEK (Polyetheretherketon).
The resistance value of 106 to 108 ohms provides optimum static protection.
For 5, 6, 8 and 12-inch wafer handling

F series Teflon(R) body

F Series Vacuum wand 

The body is made of Teflon(R) for chemical resistance.
A large selection of wafer tips available.
For 2-3, 4, 5, 6, 8 and 12-inch wafer handling


Manual Wand for Semiconductor Wafer Handling

Our unique design (Patent Pending) ensures to handle a delicate and fragile semiconductor wafer softly but firmly without excessive touch.
The surfaces of a wafer are never scratched in contrast to conventional metal tweezers.The area that contacts wafer surfaces is optically-polished to reduce surface particle counts.
L series no metal contamination

 L Series manual Wand

Withstands up to 130C continuously
For 4, 5, 6, 8 and 12-inch wafer handling
No glue or metal parts
PEEK, PPS and Conductive PEEK materials available

  Delivery/Visit address
CCT Europe b.v.
Bindersestraat 31D
5701 SX Helmond
The Netherlands

Invoice/Post-address
CCT Europe b.v.
PO Box 2108
5700 DA Helmond
The Netherlands

Tel: +31 492 780 178
Fax: +31 492 780 179
cct@cct-europe.com

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